Thermal Analysis System : Thermal Expansion Measurement System by Laser Interferometer LIX-2 series

High-accuracy measurement of thermal expansion with a minimum resolution of 1nm
This is a laser thermal expansion measurement system with ultra-high sensitivity developed by the use of the latest optical techniques. This system is suitable to be used as a calibration system for a standard thermal dilatometer, also to measure absolute thermal expansion measurements of unknown samples. This system is compliant with JIS R3251-1995, Measuring method of the linear thermal expansion coefficient for low expansion glass by laser interferometry.

Features
• Stable measurement is available with a parallel-shifting sample holder.
• High-accuracy measurement with reading resolution of 1nm
• With the use of a quartz sample, films or thin plates with thickness of 50 ～ 500μm can be measurable in the thickness direction.

Applications
• Measurement of organic films in the thickness direction
• Precise measurement of low expansion glass
• Quality control measurement of low expansion metal materials
• Measurement of seal materials
• Precise measurement of parts of electronic devices
• Measurement of calibration samples for a standard thermal dilatometer

Specifications