Nano-Particle Deposition System : Arc Plasma Source APS-1
Simultaneous deposition of different “targets”
By adding this source to APD series or your vacuum chamber, different “targets” can be deposited simultaneously and materials with new characters can be produced.
Features
• Due to size uniformity of nanoparticles compared with ones produced through previous wet process, highly active catalysts can be produced.
• Capable of selecting nanoparticle diameter from approx.1.5nm to 6nm
• Capable of generating easily oxide and nitride by changing atmosphere
• Attachable to a vacuum flange of ICF070 (VG50) or equivalent without any consideration of which direction
• Easy maintenance because no water cooling facilities are needed
Applications
• Produce chemical compounds from multiple depositions
• Add to your vacuum chamber
Specifications
|
Target size |
φ 10 × L 17 (mm) |
|
Substrate size |
φ 2 inch (φ 50 mm) |
|
Deposition rate |
0.01 ～ 0.3 nm/s *1 |
|
Film thickness uniformity |
Fe: < ± 10 % (φ 20mm area) *1 |
|
Materials Available for deposition |
Conductive materials *2 |
*1 Distance from a target to a substrate: 80mm
*2 Specific resistance of a target: 0.01Ωcm or less