Nano-Particle Deposition System : Arc-Plasma Method Nano-Particle Deposition System APD series

New nanoparticle deposition system using pulse vacuum arc discharge
Pulse vacuum arc deposition is a unique technique to deposit ultra- thin films and nanoparticles by generating metal ions in a simple process. This system can achieve high in terms of film flatness and particle fineness, which is impossible with other systems.

Features
• Capable of selecting freely nanoparticle diameter from approx.1.5nm to 6 nm by changing condenser capacity
• Any conductive materials (targets) can be converted into plasma.
*Specific resistance of a target: 0.01Ωcm or less
• Capable of generating easily oxide and nitride by changing atmosphere
• Nanoparticles supported by this system show highly active catalytic effect compared with ones produced through wet process.

Applications
• APD-S (Substrate deposition model)
Metal film (magnetism, Plasmon, protection film)
• APD-P (Powder support model)
Fuel cell catalyst by use of nanoparticles, exhaust gas catalyst, photocatalyst, VOC dispersed catalyst, carbon nanotube catalyst, Plasmon

Specifications