Infrared Lamp Heating System : Mini Lamp Annealer MILA-5050
Heat treatment up to 50 mm square size
This system is a new model of MILA-5000 Series, which has been valued by many customers. It is capable of heat treatment of up to 50mm square size samples and has been developed with still having a compact body.
Features
• Heat treatment up to the maximum 50 mm square size samples
• Maximum operating temperature 1200°C
• Desktop type in which heating furnace, chamber and temperature controller are all integrated
• Simple input of temperature recipe into computer connected with USB
• Display temperature data on the PC monitor during heating
Applications
• Rapid thermal annealing of Si wafer and compound wafer
• Rapid thermal annealing of electronics material like substrates of optical CVD
• Heat treatment of glass substrates, ceramics and compound materials etc
• Thermal cycle test
• Thermal annealing of metal materials
• Heat resistance evaluation of coating films
• Heating and drying of organic materials and resins
Specifications
|
Temperature Range |
RT ～ 1200 °C |
|
Heating rate |
50 °C/s |
|
Sample Size |
□ 50 or φ 50 × t 2 (mm) |
|
Atmosphere |
Vacuum, Gas flow |
*Vacuum pumping system is optional.
*Heating temperature changes according to the heated sample’s infrared reflectance, absorption, heat capacity, and material.