Infrared Lamp Heating System : Mini Lamp Annealer MILA-5000 series
Best for research and development on small samples
The MILA-5000 series can perform high speed heating, high speed cooling, and clean heating, which are characteristics of the Infrared Gold Image Furnace. It can heat materials under adjustable atmospheres and combines a temperature controller and variable atmosphere chamber into a single low-cost infrared lamp heating system. Heating operations can be run by a PC connected via USB and data can be easily managed.
Features
• 50°C/s high speed heating.
• Select the desired atmosphere from vacuum, gas, gas flow, air.
• Precise temperature control.
• Compact, table-top design.
• Simple input of temperature recipe into computer connected with USB
• Display temperature data on the PC monitor during heating
Applications
• Crystal annealing of ferroelectric thin films.
• Diffusion annealing, oxide film deposition annealing after ion implantation.
• Sintering, alloying treatment of Si and compound wafers.
• Glass substrate uniform temperature annealing.
• Thermal cycle, thermal shock, thermal fatigue testing.
• Temperature programmed desorption testing, catalytic effect testing
Specifications
|
Model |
MILA-5000-P-N (high temperature type) |
MILA-5000-P-F (uniform temperature type) |
|
Temperature Range |
RT ～ 1200 °C |
RT ～ 800 °C |
|
Sample Size |
□ 20 × t 2 (mm) |
|
|
Atmosphere |
Air, Vacuum, Gas flow |
|
*Vacuum pumping system is optional.
*Heating temperature changes according to the heated sample’s infrared reflectance, absorption, heat capacity, and material